Korvus Technology

Cluster Systems

Staying true to the philosophy of flexibility and upgradability, the “HEX-L Cluster” from Korvus allows users to begin with a single HEX-L chamber, and then connect further HEX-L chambers later on for in-vacuum transfer of samples between them.

Modular Cluster Systems

Cluster PVD systems are critical to many researchers who use thin films. The concept of the cluster system is essentially multiple PVD chambers connected together, with automated transfer of samples between them while maintaining vacuum. This can be useful for:

  • Creating multilayers of different classes of materials, such as metals and organics, while avoiding cross-contamination or exposure of the sample to air.
  • Separating “stages” of thin-film processing, such as “etching/cleaning”, “deposition” and “characterisation” into different chambers. This is often useful in semiconductor fabrication.
  • Expanding the space allowed for the amount of deposition sources and other instruments to be used in deposition processes. For example, with one HEX-L chamber you can fit 5 sputtering sources, but with two HEX-L chambers connected in to a cluster, you can fit 10.

Flexibility in Cost and Purpose

The HEX-L Cluster maintains all the great modular aspects of the base HEX Series that has made it so popular. With easy-to-switch deposition sources and removable panels, the HEX Series is future-proof.

The HEX-L cluster adds another layer of modularity and cost-flexibility to this product range. Being able to add a single HEX-L chamber at a time to your cluster allows users to let capital investment follow the increasing demands of their facility and budgetary constraints.

Additionally, the use of an in-house designed robotic transfer arms greatly reduces costs compared to sourcing a third-party transfer mechanism.
All these factors combine to democratise access to cluster systems for researchers in thin-film deposition.

Customise with Sources

We have a range of deposition sources to customise the HEX and HEX-L, depending on your required applications. If you’re unsure, please contact one of our technical specialists.


Our high-accuracy (sub-monolayer) mini E-beam evaporators are ideal for ultra-thin film deposition with reliable process control. Material can be evaporated from rods or materials held in a crucible.

Korvus Thermal Evaporation System


The single thermal boat source allows for the integration of a range of thermal boats for the deposition of both metals and organics/polymers.


The FISSION source enables RF and DC sputtering functionality. Designed for 2″ diameter targets, the sputter sources are equipped with SmCo magnets and accept targets with thickness ranging from 0.5 to 6mm of non-magnetic materials and up to 1mm for magnetic materials.
OCRA image


The ORCA organic deposition source is designed to operate between 50 and 600 C to allow sensitive organic materials to be evaporated with precise control

Thin Film Applications

Learn more about the applications of thin film deposition from the articles on our blog.