Korvus Technology

HEX vs HEX-L

Within the HEX Series of PVD systems, there are two options: the HEX and the HEX-L. While the core philosophy of modularity remains the same in both systems, there are key differences to consider when deciding which one is right for you.

HEX

Benchtop or rack-mounted compact system

4″

(100mm)

Maximum Sample Size Diameter

 Up to

3

Deposition Sources

12 L

Chamber Volume

9×10-7

Base Pressure (mbar)

Glovebox Integration

Loadlock Option

HEX-L

Larger mobile base-stand-mounted system

6″

(150mm)

Maximum Sample Size Diameter

Up to

6

Deposition Sources

50 L

Chamber Volume

9×10-7

Base Pressure (mbar)

Glovebox Integration

Loadlock Option

Customise with Sources

We have a range of deposition sources to customise the HEX and HEX-L, depending on your required applications. If you’re unsure, please contact one of our technical specialists.

Korvus TAU E-Beam Evaporation System

TAU

Our high-accuracy (sub-monolayer) mini E-beam evaporators are ideal for ultra-thin film deposition with reliable process control. Material can be evaporated from rods or materials held in a crucible.

Korvus Thermal Evaporation System

TES

The single thermal boat source allows for the integration of a range of thermal boats for the deposition of both metals and organics/polymers.

Fission magnetron sputtering system secondary angle

FISSION

The FISSION source enables RF and DC sputtering functionality. Designed for 2″ diameter targets, the sputter sources are equipped with SmCo magnets and accept targets with thickness ranging from 0.5 to 6mm of non-magnetic materials and up to 1mm for magnetic materials.

ORCA

The ORCA organic deposition source is designed to operate between 50 and 600 C to allow sensitive organic materials to be evaporated with precise control

Thin Film Applications

Learn more about the applications of thin film deposition from the articles on our blog.