The HEX Series – Typical System Configurations

The HEX series is designed with a truly modular concept in mind and ensuring that one chamber can be configured in a number of different ways, turning a Sputtering system into an EBeam chamber in a matter of minutes, or even a PVD system into a CVD chamber.

All of the system configurations can be achieved with either the HEX-S chamber for samples of up to 100mm, or the HEX-L design accommodating 150mm substrates.

Glovebox Integration & Multi Chamber Systems

The HEX system is also ideal for glovebox integration and the chambers can be combined to form honeycomb and in-line multi-chamber systems with sample transfer between the chambers.Thin film depition system integrated into glovebox

Please see below a few of our most popular system configurations, however, due to the HEX’s flexibility, many more are available, please contact us if you have a bespoke design in mind and we would be more than happy to provide you with all of the information and pricing required.

Sputtering System – HEX-FIS-1-S

The Fission magnetron sputtering PVD system can be configured to have either RF or DC power, the number of sources per chamber range from 1 to 4 and they can be mounted to the system as either sputter up or down. The HEX Fission system is an ideal tool for routine coatings of metals or insulators with thickness ranging between 5nm and many microns.

The standard configuration is as follows;

  • Fission Sputtering Source.MAGNETRON SPUTTERING
  • 80l/s Pfeiffer turbo pump with full range gauge and backing pump.
  • Viewport Panel.
  • MFC controller.
  • Static sample stage.
  • DC power supply
  • QCM -Quartz Crystal Monitor
  • Manual instrument and sample stage shutters

The following optional upgrades are also available;

  • Rotating sample stage – to improve sample uniformity
  • 300l/s pump – to improve base pressure and pump down time
  • RF power supply – for insulating materials
  • Automatic shutters together with the custom software package Niobium – to allow full system control from a laptop.
  • Extra Fission Sputtering Sources

For more information or a quotation please contact us or download our brochure here.

EBeam System – HEX-TAUs-1-S

The TAU EBeam evaporation system can be configured with either the single pocket TAU-S EBeam source or the four pocket TAU-4 allowing co evaporation. The HEX Tau system is an ideal tool for evaporating refractory materials or metals/insulators, particularly where a high degree of film thickness accuracy is required, collimated deposition is required (e.g. for masked samples), very thin layers are needed or for temperature sensitive samples.

The standard configuration is as follows;

  • TAU EBeam Source.
  • 80l/s Pfeiffer turbo pump with full range gauge and backing pump.EBEAM EVAPORATION
  • Viewport Panel.
  • Static sample stage.
  • 250w Power supply.
  • QCM -Quartz Crystal Monitor.
  • Manual instrument and sample stage shutters.

The following optional upgrades are available;

  • Rotating sample stage – to improve sample uniformity.
  • 300l/s pump – to improve base pressure and pump down time.
  • 500w power supply – for more difficult materials such as Tungsten or Platinum.
  • Automatic shutters together with the custom software package Niobium – to allow full system control from a laptop.
  • Extra TAU-S Sputtering Sources – to allow the evaporation of several layers without breaking vacuum.
  • TAU-4 – to enable the co or sequential evaporation of materials.

For more information or a quotation please contact us or download our brochure here.

Contact Metallisation System – HEX-M-TES-1-S

The TES or TAU contact metallisation PVD system can be configured with either the TES thermal evaporation source, the single pocket TAU-S EBeam source or the four pocket TAU-4. The HEX metallisation system is an ideal tool for the simple deposition of metals for electrical contacts, solar cells and semiconductor applications. The TES version is robust and simple to use with a low consumables cost.

The standard configuration is as follows;

  • TES thermal evaporation source.THERMAL BOAT SOURCE
  • 80l/s Pfeiffer turbo pump with full range gauge and backing pump.
  • Viewport Panel.
  • Static sample stage.
  • 600w Power supply.
  • QCM -Quartz Crystal Monitor.
  • Manual instrument and sample stage shutters.

The following optional upgrades are available;

  • Rotating sample stage – to improve sample uniformity.
  • 300l/s pump – to improve base pressure and pump down time.
  • 1.5kw power supply – for specialised boats or materials that require higher temperatures
  • Automatic shutters together with the custom software package Niobium – to allow full system control from a laptop.
  • Extra TES thermal evaporation sources – to allow the evaporation of several layers without breaking vacuum.
  • TAU-S or 4 – for evaporation of refractory materials or metals/insulators, particularly where a high degree of film thickness accuracy is required, collimated deposition is required (e.g. for masked samples), very thin layers are needed or for temperature sensitive samples.

For more information or a quotation please contact us or download our brochure here.

Lift Off System – HEX-L-TAUs-1-C

The HEX TAU lift off system can be configured with either the single pocket TAU-S EBeam source or the four pocket TAU-4. The HEX lift off system is an ideal tool for metallisation during the lift off process. The low thermal load of the TAU sources allows deposition closer to the sample than with other deposition sources without damaging the photo resist. As an additional precaution the system is equipped with a cooled sample stage.

The standard configuration is as follows;

  • TAU-S EBeam evaporation source.heated sample stage
  • 80l/s Pfeiffer turbo pump with full range gauge and backing pump.
  • Viewport Panel.
  • Static Water Cooled sample stage.
  • 250w Power supply.
  • QCM -Quartz Crystal Monitor.
  • Manual instrument and sample stage shutters.

The following optional upgrades are available;

  • Rotating sample stage – to improve sample uniformity.
  • 300l/s pump – to improve base pressure and pump down time.
  • 500w power supply – for more difficult materials such as Tungsten or Platinum.
  • Automatic shutters together with the custom software package Niobium – to allow full system control from a laptop.
  • Extra TAU-S evaporation sources – to allow the evaporation of several layers without breaking vacuum.
  • TAU-4 EBeam source – to enable the co or sequential evaporation of materials.

For more information or a quotation please contact us or download our brochure here.

Organics/Polymer Deposition System – HEX-ORCA-1-S

The HEX Orca organic deposition system is equipped with an Orca low temperature organic evaporation source and comes with various sample stage options including, heating, water cooling, rotating and temperature gradient.  The HEX Orca system is an ideal tool for the evaporation of low temperature materials such as organic materials for OLED structures or low atomic number polymers.

The standard configuration is as follows;ORGANIC EVAPORATOR

  • ORCA organic low temperature evaporation source.
  • 80l/s Pfeiffer turbo pump with full range gauge and backing pump.
  • Viewport Panel.
  • Static Water Cooled sample stage.
  • DC Power supply.
  • QCM -Quartz Crystal Monitor.
  • Manual instrument and sample stage shutters.

The following optional upgrades are available;

  • Rotating sample stage – to improve sample uniformity.
  • Heated sample stage – for deposition materisls at higher temperatures.
  • Temperature gradient sample stage – for quick analysis of the optimum deposition temperature of specific materials.
  • 300l/s pump – to improve base pressure and pump down time.
  • Automatic shutters together with the custom software package Niobium – to allow full system control from a laptop.
  • Extra ORCA evaporation sources – to allow the evaporation of several layers without breaking vacuum.

For more information or a quotation please contact us or download our brochure here.

In-Situ Measurement

Due to the modular nature of the systems in the HEX range, they can also be equipped with various in-situ measurement options allowing for deposition and analysis without breaking vacuum including spectroscopy, ellipsometry and many more.

HEX CVD System

The HEX range of modular deposition systems also has the ability to be transformed from a PVD system into a Chemical Vapor Deposition system in a matter of moments. Please contact us for further information, configuration options or a quotation.

PLD System

The Hex can also be equipped with special side panels to allow for PLD within the chamber, please contact us regarding your specific requirements and we can tailor a system to suit your research perfectly.