Korvus Technology

Sputtering in PVD

Sputter deposition is a physical vapour deposition (PVD) method of depositing thin films by sputtering material from a ‘target’, then depositing it onto a ‘substrate’. Magnetron sputtering applies a magnetic field around the target in order to energize argon atoms for bombarding the target.

The Fission magnetron sputtering source enables rapid, contaminant-free deposition of metal or dielectric films in the HEX modular deposition system. Water-cooling and gas connections are made using quick-release connectors, removing the need for specialist tools to dismount the source and eliminating the hazard and inconvenience of draining coolant-water each time the source is removed from the chamber. Source mounting is also efficient and simple, without the need for specialist tools.

The Fission source can be operated in DC mode for conducting materials and RF mode for insulating materials. Gas introduction is through the gas hood, allowing a higher partial pressure to be achieved near the target surface and thereby reducing the overall chamber pressure required during deposition. The source can be equipped with manual or motor-driven shutters and can be controlled using our PC automation option.

Reactive sputtering can be enabled either by introducing additional gases directly with the sputtering gas or with a separate gas feed in the chamber. Magnetic materials can be sputtered using an optional strong magnet set which allows targets up to 1mm thick to be sputtered. The Fission source can be used to sputter all (solid) metals, insulators and semiconductors. Multiple sources may be used in one system in order to grow multilayer or composite material films.

Join the Korvus team to discuss the technical details of different sputtering techniques and processes, including: DC, RF, HiPIMS, Pulsed-DC and more…

 

The HEX series – compact, highly modular PVD and Cluster systems

In this webinar we will cover the following topics:

1. Introduction to Korvus Technology
2. Comparison versus traditional PVD systems
3. System design
4. HEX, HEX-L and HEX-L Cluster Systems
5. Configurations
6. Sample tables
7. Sources
8. Third party add ons (Langmuir Probe & HIPIMs)
9. Accessories
10. Key users
11. Q&A session with our product expert.

A recording of the webinar will be sent to each attendee. Remember, if you have any additional questions, reach out to us.

 

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Advancements in Physical Vapor Deposition (PVD) for Battery Research

Physical Vapor Deposition (PVD) is used industrially for depositing nanometers-to-microns of a material to produce functional layers/alter surface properties. The technique is paramount in pioneering the development of solid-state/lithium-ion batteries.

Key solid-state challenges are impedance at the cathode-electrolyte interface, volumetric energy density, and dendrites/crack formation during cycling. PVD is ideally suited to manufacturing promising solutions, whilst allowing high-throughput screening of novel material compositions to enhance electrochemical properties.

The HEX is a cost-effective system, mountable beneath an existing glovebox for fully inert development. The unique configuration maximizes glovebox space and enables easy atmosphere-side modification/cleaning. The high modularity facilitates changes without specialist tools, enabling rapid changes in research approach without additional costs. Integration of sputtering/thermal/e-beam/organic evaporation/substrate heating allows extensive material production capabilities.

 

This webinar will focus on the following key topics:

• PVD techniques used to produce functional layers/alter surface properties

• Development of model systems to study interfacial phenomena

• High throughput screening of novel materials to enhance electrochemical properties

• Introduction to the HEX series of PVD instrument and its key advantages for research, including unique mounting position below the glovebox

 

A PDF copy of the presentation will be sent to all attendees after the event.

Presenter Dr. Bryan Stuart – Head of R&D, Korvus Technology

Bryan Stuart has over 10 years of experience in the development of next generation Physical Vapor Deposition (PVD) technologies for enhancing manufacturing capabilities in Energy Storage applications from Solar Cells to Solid State Batteries. He leads R&D at Korvus Technologies as they seek to broaden and scale their product range.

 

Korvus Technology is a proud sponsor of this event.