Customisations

HEX-L with Magnetron Sputtering, Ion Gun, High Powered E-beam and Optical Monitoring
KORVUS TECHNOLOGY

Seemless Integration of third-party instruments - An unrivalled ability to be customised

HEX series panels are easily changed, allowing for the modification of the vacuum chamber. This unique feature enables easy addition of any instrument after initial system purchase, eliminating costly design work, engineer visits, and system downtime.

The options available include:

  • High Powered E-Beam
  • Ion Gun
  • Optical Monitoring
  • Nanoparticle
  • RGA
  • Soft Sputtering

With its uniquely modular design, the HEX series offers the ability to integrate a range of third-party deposition and analytical techniques. This proveds unparalleled options for modification and enhancement. Even after purchase, customers can adjust their system to suit their research

HEX-L integrated wth Theris Nanotechnology Nanoparticle Source
HEX-L Integrated with Plasma Quest HiTUS Source

Korvus is delighted to work in close partnership with two other UK companies, Theris Nanotechnology and Plasma Quest.

Theris are manufacturers of nanoparticle sources that enables the creation of ultra pure and size selected nanoparticle films and the additional options of creating high entropy alloys and core-shell nanoparticles.

Plasma Quest have developed a source technology that contains the plasma over the magnetron. This has a number of benefits compared to regular magnetrongs:

  • Additional process space to deliver new coatings/properties
  • Enables High Target Utilisation Sputtering (HiTUS®)
  • Stable deposition for oxide and nitride thin films
  • Deposition on to delicate substrates (low temp/damage deposition)
  • Conformal coverage of uneven surfaces for a wide range of applications
  • Less material wastage (full surface target erosion, no racetrack!)
  • High deposition rate for ferromagnetic thin films
  • Low stress control
  • Excellent adhesion