HEX Cluster Systems

HEX-L Dual Cluster
HEX Cluster Robotic Arm in Antechamber
THE HEX SERIES

PVD Cluster Systems

Staying true to our philosophy of flexibility and upgradability, the “HEX Cluster Systems” from Korvus allows users to begin with a single HEX-L chamber, and then connect further HEX-L chambers later on for in-vacuum transfer of samples between them.

Korvus Technology’s PVD cluster system provides a solution to make the thin film deposition process more flexible, cost-effective and efficient.

Our HEX PVD systems are unique in their versatility.

The highly modular design prioritises customisation and flexibility for manufacturers and researchers using thin film deposition.

The HEX PVD cluster system produces thin films sustainably and efficiently. With the HEX PVD cluster system, you can:

  • Develop multi-layers of different classes of materials
  • Separate stages of thin film deposition processes into different chambers
  • Expand PVD capacity with more deposition chambers, sources and tools
  • Future proof your research
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KORVUS TECHNOLOGY

Thin Film Deposition

The HEX PVD cluster system produces thin films sustainably and efficiently. With the HEX PVD cluster system, you can: 

  • Develop multi-layers of different classes of materials
  • Separate stages of thin film deposition processes into different chambers
  • Expand PVD capacity with more deposition chambers, sources and tools
  • Future proof your research

Since the HEX-L system is highly modular, you can begin with a base model and upgrade as needed. Using this method eliminates unneeded downtime and installation costs. Our systems fit a variety of research and manufacturing purposes.

PVD Cluster Systems
Vacuum Deposition
THE HEX SERIES

How Do Multi-Chamber Systems Work in The Thin Film Deposition Process?

PVD cluster systems consist of three components: 

  • Vacuum Loadlocks
  • Process Chambers
  • A Central Robot

The process begins with the introduction of the substrate.

You then place a material in the vacuum to vaporise it.

With a multi-chamber system like the HEX-L, you can use various deposition techniques at once.

The thin film is then transferred onto the substrate in an even layer.

The HEX Cluster System makes the thin film deposition process more cost-efficient, timely, and effective.

Korvus Technology

Customise With Sources

Most thin film deposition systems have limited functionality. The HEX-L system adapts to your needs. We have several deposition sources to customise the sources used in the system, including: 
 

Magnetron Sputtering Scource

FISSION- Magnetron Sputtering Source

Designed for 2″, 3″ and 4″ diameter targets, the sputter sources are equipped with SmCo magnets and accept targets with thickness ranging from 0.5 to 6mm of non-magnetic materials and up to 1mm for magnetic materials. The most flexible source, the FISSION can be paired with DC, RF, HiPIMS, Pulsed-DC and more…
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low temperature evaporation

ORCA - Low Temperature Evaporation

The ORCA organic deposition source is designed to operate between 50 and 600 C to allow sensitive organic materials to be evaporated with precise control. This source can also be used to evaporate low-temperature metals such as Lithium, and pairs well with the glovebox integration of the HEX Series.
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electron beam evaporation

TAU - Electron Beam Evaporation

Our high-accuracy (sub-monolayer) mini E-beam evaporators are ideal for ultra-thin film deposition of high-temperature metals with reliable process control. Material can be evaporated from rods or material held in a crucible. Our novel design allows the material to be co-deposited from four individual pockets.
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thermal boat evaporation

TES - Thermal Boat Evaporation

The single thermal boat source from Kovus Technology allows for the integration of a range of thermal boats for the deposition of metals. This allows for an extremely inexpensive, very robust and effective source, the TES is also ideal for those who want to thermally evaporate standard metals.
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KORVUS TECHNOLOGY

Applications of a PVD Cluster System