Introduction

One of the unique selling points of Korvus Technology’s “HEX Series” of PVD systems is that customers can integrate any third-party components on standard vacuum flanges at any point after initial purchase of the system.

Korvus Technology are excited to announce a joint webinar and partnership with fellow-UK company Plasma Quest Ltd, who have pioneered a new way of sputtering to make thin film coatings. Conventional magnetron sputtering generates a plasma at the sputter target, whereas Plasma Quest’s technology generates a remote plasma independent from the sputter target in an ICP (inductively coupled plasma) source. This comes with a few advantages:

1) Target utilisation of 90% versus 40% with magnetron sputtering (this is where the name HiTUS- High Target Utilisation Sputtering- comes from.)

2) Independent control of both plasma ion density and ion energy. This allows for high deposition rates and an ionised PVD process while maintaining low ion-energy for deposition on sensitive substrates. The reverse is also possible- low deposition rates for ultrathin films with high ion-energy for dense and adherent coatings.

Applications include:

• Stress-sensitive coatings
• Energy-sensitive substrates (2D materials, polymers, perovskites)
• Precious metal films
• Conformal coatings (i.e. trenches or vias)
• Reactive sputtering processes and optical coatings
• Micron-thickness magnetic coatings

Schedule:

15:00-15:10: Korvus Technology’s discussion conventional magnetron sputtering, as well as some other sputtering methods.

15:10-15:40: Plasma Quest’s discussion on their HiTUS remote plasma sputtering technology

15:40-15:50: Integration of the HiTUS source into the modular HEX platform

15:50-16:00: Q&A Session

All registered parties will receive a link to access the recording of this webinar after September 11th.